Remote Plasma Monitoring System
R.P.M
Features & Benefits
- Most of CVD tools used Fluorine Radical for chamber clean with RPS(Remote Plasma Source).
- 1.Possible to check a degradation at RPS.
- 2. Possible to prevent contamination by inadequate chamber clean with RPS.
- 3. Improved a yield
- 4. Improved Process Time
Configuration
- Full Scale Range : 05K / 07K / 11K / 14K
- Accuracy (Analog) ±1% of Full Scale
- Repeatability ±0.2% of Full Scale
- Output Signal Analog Output 0~5 VDC (Option 0~10 VDC)
- RS232, RS485
- Ethernet
- DeviceNET
- Normal Operating Temperature Range 0℃ to 80℃
- Connector Types Analog 9-pin Type ”D”
- Digital Ethernet , DeviceNET
Optional
- RS-232/422/485, RS-422/485, Ethernet
- POWER HIGH/LOW Limit ,Logging level
- RPS ERROR & Alarm, Life Time Data Logging
- Real Voltage, Current Display
